Do Mandalas Exhibit Archetypal Patterns Based on Kellogg’s MARI? A Pilot Study

Authors

  • Renée van der Vennet Nazareth College
  • Caitlin Cassella Clifton Springs Hospital, Rochester Regional

Abstract

The Mandala Assessment Research Instrument (MARI) can be used to assess mandalas drawn by participants as part of the therapeutic process. This study investigated whether a set of 85 mandalas drawn over 15 years by the first author depicts archetypal patterns as defined by Kellogg’s Great Round of archetypal stages in mandalas in the MARI and if these patterns relate to significant events in the person’s life. The research questions are: (a) “Do archetypal patterns and MARI stages, as depicted in the MARI Great Round, appear in this dataset?” (b) “Do archetypal patterns correspond to significant events in the first author’s life?” and (c) “Do certain archetypal patterns relate to certain significant events?” The results demonstrated that archetypal patterns exist in mandalas. With the appropriate training, counsellors could use mandalas and the MARI throughout the therapeutic process.

Author Biographies

Renée van der Vennet, Nazareth College

Renée van der Vennet is a professor of art therapy and the art therapy program director in the Creative Arts Therapy Department of Nazareth College in Rochester, New York. Her main interests are art therapy interventions including the use of mandalas and dreams in therapy, art therapy processes involving process and product painting, and the creative process.

Caitlin Cassella, Clifton Springs Hospital, Rochester Regional

Caitlin Cassella is a program manager, practising licensed creative art therapist, and addictions therapist at Clifton Springs Hospital in Clifton Springs, New York.

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Published

2020-08-27

How to Cite

van der Vennet, R., & Cassella, C. (2020). Do Mandalas Exhibit Archetypal Patterns Based on Kellogg’s MARI? A Pilot Study. Canadian Journal of Counselling and Psychotherapy, 54(3), 388–412. Retrieved from https://dev.journalhosting.ucalgary.ca/index.php/rcc/article/view/68975

Issue

Section

Special Issue Articles/ Articles d'édition spéciale